by jbs052010 c3 — May 26, 2010—GE Lighting announced the winners of the 2009 GE Edison Award and associated awards in its 27th annual lighting design competition recently at Lightfair 2010 in Las Vegas. The GE Edison Award competition is open to lighting professionals who creatively employ significant use of GE light sources (lamps and/or LEDs) in a lighting design project completed during the previous calendar year.
The 2009 GE Edison Award was presented to Andreas Schulz and Alexander Rotsch of Licht Kunst Licht AG (Bonn, Germany) for lighting EnBW City in Stuttgart, Germany. EnBW City is the new headquarters complex of EnBW, German supplier of power, gas and water. GE says the facility’s lighting design exemplifies architectural integration and more than meets strict European regulations for power consumption.
The winning entry was selected for its superiority in the following categories: functional excellence; architectural compatibility; effective use of state-of-the-art lighting products and techniques; appropriate color, form and texture revelation; energy effectiveness and cost effectiveness.
The winning project was one of five Awards of Excellence finalists. The other Awards of Excellence winners were:
1100 First Street NE (Washington, DC), designed by George Sexton Associates (Washington, DC);
Emil Schumacher Museum (Hagen, Germany), designed by Andreas Schulz and Tanja Baum of Licht Kunst Licht AG (Bonn, Germany);
Novartis Campus—Maki Office Building (Basel, Switzerland), designed by Andreas Schulz, Martina Weiss and Thomas Möritz of Licht Kunst Licht AG (Bonn, Germany); and
MUAC University Museum of Contemporary Art (México City, México), designed by Gustavo Avilés and Juan Carlos Martinez of Lighteam, Gustavo Avilés, SC (DF México City, México).
